官方网站:http://www.elsevier.com/wps/find/journaldescription.cws_home/600849/description#description
投稿网址:http://ees.elsevier.com/mssp/
PMC链接:http://www.ncbi.nlm.nih.gov/nlmcatalog?term=1369-8001%5BISSN%5D
半导体加工中的材料科学为讨论光电子、传感器、探测器、生物技术和绿色能源的功能材料和器件的新加工、应用和理论研究提供了一个独特的论坛。每一期将致力于提供当前的快照的见解、新成果,突破和未来趋势等不同领域的微电子、能源转换和存储、通信、生物技术(图)催化、纳米薄膜技术,混合和复合材料、化学处理、气相沉积、设备制造、和造型的支柱先进半导体加工和应用。覆盖范围将包括:用于亚微米设备的先进光刻技术;蚀刻及相关课题;离子注入;损害演化及其相关问题;等离子体和热CVD;快速热处理;先进的金属化和互连方案;介质层薄,氧化;溶胶-凝胶法加工;化学浴和(电)化学沉积;化合物半导体加工;新型非氧化物材料及其应用(宏观)分子和杂化材料;分子动力学、从头算方法、蒙特卡罗方法等;分立电路和集成电路的新材料和新工艺;磁性材料和自旋电子学;异质结构和量子器件;半导体光电特性工程;晶体生长机制;可靠性,缺陷密度,固有杂质和缺陷。
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
大类学科 | 分区 | 小类学科 | 分区 | Top期刊 | 综述期刊 |
工程技术 | 3区 | ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合 PHYSICS, APPLIED 物理:应用 PHYSICS, CONDENSED MATTER 物理:凝聚态物理 | 3区 3区 3区 3区 | 否 | 否 |
JCR分区等级 | JCR所属学科 | 分区 | 影响因子 |
Q2 | MATERIALS SCIENCE, MULTIDISCIPLINARY | Q2 | 4.644 |
PHYSICS, APPLIED | Q2 | ||
PHYSICS, CONDENSED MATTER | Q2 | ||
ENGINEERING, ELECTRICAL & ELECTRONIC | Q2 |
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