INTEGRATED FERROELECTRICS

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官方网站：http://www.tandfonline.com/toc/ginf20/current

投稿网址：http://www.tandfonline.com/action/authorSubmission?journalCode=ginf20&page=instructions

PMC链接：http://www.ncbi.nlm.nih.gov/nlmcatalog?term=1058-4587%5BISSN%5D

集成铁电学为从事集成铁电器件研究、设计、开发、制造和应用的电子工程师、物理学家、过程和系统工程师、陶艺家和化学家提供了一个国际性、跨学科的论坛。这种器件将铁电薄膜和半导体集成电路芯片结合起来。其结果是一种新型的电子器件，它结合了铁电材料独特的非挥发性存储器、热释电、压电、光折变、硬辐射、声学和/或介电性能，以及半导体集成电路技术的动态存储器、逻辑和/或放大性能、小型化和低成本优势。

Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.